Inline electrical yield versus optical inspection: Correlations, connections and disconnections
In: 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); (2016-05-01) S. 451-455
Online
Konferenz
Zugriff:
Titel: |
Inline electrical yield versus optical inspection: Correlations, connections and disconnections
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Autor/in / Beteiligte Person: | Zheng, Fan ; Salvador, Dave ; Gow, Cathy ; Kermel, Lori ; Rhoads, Bryan ; Zhang, Kan ; Pan, Xiao ; Stahl, Ben ; Davies, William ; Tessier, Amanda ; Crawford, Edward ; Sheraw, Rebekah ; Ahsan, Ishtiaq ; Engel, Brett ; Austin, Brad ; Xin, Yongchun ; Sim, Jang |
Link: | |
Quelle: | 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); (2016-05-01) S. 451-455 |
Veröffentlichung: | 2016 |
Medientyp: | Konferenz |
ISBN: | 978-1-5090-0270-2 (print) |
ISSN: | 2376-6697 (print) |
DOI: | 10.1109/ASMC.2016.7491094 |
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